Technology History | KLA — Photomask Inspection After Computervision Left the Tools
· 1976-1
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Technology History | KLA — Photomask Inspection After Computervision Left the Tools
kevin
People treat KLA as the Milpitas campus at Three Technology Drive that always sold yield tools beside Applied and Lam.
The first book was a photomask inspector spun out of someone else's exit.
Kenneth Levy and Robert Anderson had met at Computervision, where Levy was asked to commercialize a wafer-alignment invention.
When Computervision left semiconductor equipment, Levy stayed in the field and founded KLA Instruments in 1976.
The first product, the KLA 100, shipped in 1978.
It compared a photomask to a database or to another mask and cut inspection from about eight hours of microscope work to roughly fifteen minutes, with fewer missed defects.
Tencor Instruments, founded the same year by Karel Urbanek and John Schwabacher, sold step-height metrology and later the Surfscan particle tool.
The two firms merged in 1997 as KLA-Tencor, later shortened to KLA Corporation, and kept headquarters in Milpitas.
The mechanism is process control, not lithography itself.
A chip line that cannot see a defect on a mask or a particle on a wafer will print that error onto every die.
KLA sold the eyes that sit beside the steppers.
Stand on Technology Drive and you are at the campus that grew from that first mask inspector.
Photo: Wikimedia Commons, Milpitas, California.
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